The obtained SiNWs are vertically oriented, following the crystal

The obtained SiNWs are vertically oriented, following the crystallographic orientation of the Veliparib in vitro Si wafer. Depending on the resistivity and type of the parent Si wafer and the fabrication conditions used, the structure and morphology of the SiNWs

are different. The SiNWs that result from the etching of highly doped Si wafers show a FRAX597 in vitro porous structure [11–19]; however, the question if the nanowires are fully porous or they contain a Si core and a porous Si shell is still pending. The photoluminescence (PL) from porous SiNWs by MACE was investigated in a number of recent papers [13–19]. In this work, we investigated the structure, morphology, and photoluminescence from SiNWs fabricated by a single-step MACE process on highly doped p-type (100) Si wafers with a resistivity of approximately 0.005 Ω·cm and the effect of different surface chemical treatments on the above. We used scanning and transmission electron microscopy to demonstrate that the obtained nanowires were fully porous, and this result was further supported by the fact that they were fully dissolved in an HF solution after successive HF and piranha treatments. We also demonstrated that a porous Si layer is formed on the Si wafer underneath the SiNWs, the thickness of which increases with the increase of the etching time. The chemical composition of the

surface VEGFR inhibitor of the Si nanostructures composing the porous Si nanowires was investigated after each chemical treatment and correlated with their photoluminescence properties. Methods SiNWs were fabricated on highly doped (100) p-type Si wafers (resistivity of approximately 0.005 Ω·cm) using a single-step MACE process. The samples were cleaned with acetone and propanol, dried in nitrogen blow, and immersed into the etching chemical aqueous solution that contained 4.8 M HF and 0.02 M AgNO3. The temperature of the solution was 30°C, and the immersion time was either Ureohydrolase 20 or 60 min. After etching, the samples were dipped into 50%

HNO3 to completely dissolve the Ag dendrites and any other Ag residues that were formed on the SiNW surface [20]. The as-formed SiNWs were then subjected to different successive chemical treatments, including a dip in 5% aqueous HF solution at room temperature for 10 min and piranha cleaning in 1:1 v/v H2O2/H2SO4 solution for 20 min. Piranha cleaning is an oxidizing process, while the HF chemical solution removes any native or chemical oxide from the Si surface. The SiNW morphology was characterized by field-emission scanning electron microscopy (SEM) (JEOL JSM-7401F, JEOL Ltd., Akishima, Tokyo, Japan) and transmission electron microscopy (TEM). Their surface chemical composition was characterized by Fourier transform infrared spectroscopy (FTIR).

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